Summary
The lecture will cover both fundamental and practical insights on stress evolution during physical vapor deposition of thin films, with the aim of understanding the origin of intrinsic stress, how to measure it and how to mitigate it.
Topics
- Origins of residual stress in PVD thin films
- Measurement methods of residual stress
- Substrate curvature technique: implementation and limitations
- X-ray diffraction stress analysis
- In situ stress evolution during film growth: selected examples
- Epitaxial growth and stress relaxation
- Stress evolution during polycrystalline film growth
- Interface reactivity, phase transition
- Strategies to control and mitigate stress for specific applications
Instructor
Gregory Abadias
Professor, Physics and Materials Science Department
Institut Pprime, Université de Poitiers Chasseneuil-Futuroscope, FR
