Summary
The different stress sources in PVD thin films will be discussed, and the atomistic and microstructural origins of the intrinsic stress development during thin film growth will be highlighted. An overview of stress models will be provided.
Topics
- Archetypal stress evolutions
- Linking stress development to film formation stages and microstructure evolution
- Influence of growth conditions on intrinsic stress
- Growth kinetics: Substrate temperature and Deposition flux
- Growth energetics: working pressure, bias voltage,…
- Impurities and alloying effects
- Basic understanding, atomistic mechanisms and models
- Thermodynamic concept
- Kinetic model
- Defect incorporation during energetic film bombardment
Instructor
Gregory Abadias
Professor, Physics and Materials Science Department
Institut Pprime, Université de Poitiers Chasseneuil-Futuroscope, FR
